Please use this identifier to cite or link to this item: http://dl.pgu.ac.ir/handle/1853/15879
Title: Simulation of a cylindrical CVD reactor for deposition of silicon carbide
Keywords: Silicon carbide;Vapor-plating;Chemical reactors
Issue Date: Dec-1992
Publisher: Georgia Institute of Technology
Description: M.S.;David L. McDowell
URI: https://smartech.gatech.edu/handle/1853/15879
Other Identifiers: 364076
Type Of Material: Thesis
Appears in Collections:College of Engineering (CoE)

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